Preparation of Ni Target for Cyclotron-produced ⁶⁴Cu by Electrodeposition

To prepare Ni target with high quality for producing ⁶⁴Cu using cyclotron, the target preparation process by electro-deposition method was studied. The effects of main process parameters on the performance and mass thickness of Ni target were studied. Under the optimum conditions, namely 40-50 g/L of Ni²⁺ concentration, 0.05-0.5 mol/L of HCl concentration, 10-35 mA/cm² of current density, rotation rate of 150-350 r/min, at 20-50 ℃, a high quality (good uniformity and adherence) Ni target could be made successfully.