挂镀法制备镍-63放射源工艺研究

Preparation of Ni-63 Radioactive Source by Hanging Plating Method

  • 摘要: 为了解决传统电沉积工艺制备镍-63放射源过程中出现的效率低、装置复杂等问题。以氯化镍(Ni-63)为原料,以镍为衬底,结合挂镀工艺开发了一套高效制备镍-63放射源的工艺。研究电镀液的pH、电镀温度、电镀时间、电镀电流密度对镍-63放射源产品质量的影响。在氯化镍(Ni-63)浓度为7 g/L,pH为1~3、电镀温度为常温、电镀时间为180 s、电流密度为6.5 mA/cm2的条件下,制备镍-63放射源。结果表明,该工艺与传统的电沉积工艺相比,摆脱电镀槽设计的限制,克服传统电沉积工艺中电镀器具设计复杂的缺点,可以灵活的设计放射源活性区的形状,解决了生产过程需要频繁拆卸电镀器具的问题,同时提升了生产效率。

     

    Abstract: In order to optimize the problems of low efficiency and complex equipment in the preparation of nickel-63 radioactive sources using traditional electrodeposition processes. A high-efficiency process for preparing nickel-63 radiation sources has been developed using nickel chloride (Ni-63) as raw material, nickel as substrate, and hanging plating process. The effects of pH value of electroplating solution, electroplating temperature, electroplating time, and electroplating current density on the quality of nickel-63 radioactive source products were studied. Under the conditions of nickel chloride (Ni-63) concentration of 7 g/L, pH value 1-3, electroplating temperature at room temperature, electroplating time of 180 seconds, and current density of 6.5 mA/cm2, qualified nickel-63 radiation source products were efficiently prepared. The results show that compared with traditional electrodeposition processes, this process breaks the limitations of electroplating tank design and overcomes the complex design of electroplating equipment in traditional electrodeposition processes. It can flexibly design the shape of the active zone of the radioactive source, solve the problem of frequent disassembly of electroplating equipment in the production process, and improves the production efficiency.

     

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