Pu在不锈钢基底上的电沉积

  • 摘要: 对在不锈钢基底上用电沉积法制备239Pu(α)参考源作了详细研究。试验中选择NH4Cl-HCl体系,观察了铵盐浓度、电解质酸度、电解质体积、电流密度、电镀时间、不锈钢基底材料和单面电解槽尺寸对239Pu电沉积率的影响,从而确定了最佳工艺条件,并已用于239Pu(α)参考源的批量生产中。该电镀工艺的优点是简便、快速,且获得的镀层均匀、牢固。该工艺也已成功地用于制备241Am(α)源和244Cm(α)源。

     

    Abstract: ELECTRODEPOSITIONOFPLUTONIUMONSTAINLESSSTEELBACKINGCaiShanyu(ChinaInstituteofAtomicEnergy,Beijing102413)ABSTRACTThepreparationof239Pu(α)referencesourcesonstainlesssteelbackingisperformed.Intheperiodofexperiment,theammoniumchloride-hydrochloricacidsystemisselected.Theafectof239Puelectrodepositionontheconcentrationofammoniumchloride,electrolyteacidi-ty,electrolytevolume,platingtime,currentdensity,thesizeofplatingcel,andbackingmaterial(diferenttypesofstainlesssteel)areobserved.Theoptimumprocesofplutoniumelectrodepositionisrecommendedandithasbeenusedintheproductionof239Pu(α)referencesources.Theadvantagesofthisprocessaresimple,rapidandconvenient.Moreover,thede-positsareuniformandadherent.Thisprocesshasalsobeenusedinthepreparationof241Am(α)sourceand244Cm(α)source.Keywordsradioactivesource239Putransplutoniumelectrodepositionenviron-mentalmonitoring

     

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